Перегляд за Автор "Fedorenko, V. V."

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    One and two-phonon raman scattering from nanostructured silicon
    (Одесский национальный университет имени И. И. Мечникова, 2014) Iatsunskyi, Igor R.; Nowaczyk, G.; Pavlenko, Mykola V.; Fedorenko, V. V.; Smyntyna, Valentyn A.; Яцунский, Игорь Ростиславович; Новачик, Г.; Павленко, Николай Николаевич; Федоренко, В. В.; Смынтына, Валентин Андреевич; Яцунський, Ігор Ростиславович; Новачик, Г.; Павленко, Микола Миколайович; Федоренко, В. В.; Сминтина, Валентин Андрійович
    Raman scattering from highly/low resistive nanostructured silicon films prepared by metal-assisted chemical etching was investigated. Raman spectrum of obtained silicon nanostructures was measured. Interpretation of observed one and two-phonon Raman peaks are presented. First-order Raman peak has a redshift and broadening. This phenomenon is analyzed in the framework of the phonon confinement model taking into account mechanical stress effects. Second-order Raman peaks were found to be shifted and broadened in comparison to those in the bulk silicon. The peak shift and broadening of two-phonon Raman scattering relates to phonon confinement and disorder. A broad Raman peak between 900-1100 cm-1 corresponds to superposition of three transverse optical phonons ~2TO (X), 2TO (W) and 2TO (L). Influence of excitation wavelength on intensity redistribution of two-phonon Raman scattering components (2TO) is demonstrated and preliminary theoretical explanation of this observation is presented.