Hrinevych, Viktor S.Filevska, Liudmila M.Maximenko, L. S.Matiash, I. E.Mischuk, O. N.Rudenko, S. P.Serdeha, B. K.Smyntyna, Valentyn A.2013-08-122013-08-122013Journal of Nanomaterials & Molecular Nanotechnologyhttps://dspace.onu.edu.ua/handle/123456789/3803Journal of Nanomaterials & Molecular Nanotechnology. - 2013.Internal reflection features caused by the surface plasmon resonance in nanoscale films containing defect tin dioxide clusters in the stoichiometric dielectric matrix are studied by means of polarization modulation of electromagnetic radiation. The angular and spectral characteristics of reflectances Rs2 and Rp2 of s- and p-polarized radiation and their polarization difference ρ=Rs2–Rp2 are measured in the wavelength range λ=400-1600 nm. The obtained experimental characteristics ρ(θ, λ) (θ is the radiation incidence angle) represent the optical property features associated with the film structure and morphology. Surface plasmon polaritons and local plasmons excited by s- and p-polarized radiation are detected; their frequency and relaxation properties are determined. The technique employed for studying surface plasmon resonance in tin dioxide films is appeared to be structurally sensitivenTin dioxideThin filmSurface Plasmon resonanceArticle