Please use this identifier to cite or link to this item: http://dspace.onu.edu.ua:8080/handle/123456789/3803
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dc.contributor.authorHrinevych, Viktor S.-
dc.contributor.authorFilevska, Liudmila M.-
dc.contributor.authorMaximenko, L. S.-
dc.contributor.authorMatiash, I. E.-
dc.contributor.authorMischuk, O. N.-
dc.contributor.authorRudenko, S. P.-
dc.contributor.authorSerdeha, B. K.-
dc.contributor.authorSmyntyna, Valentyn A.-
dc.date.accessioned2013-08-12T10:33:33Z-
dc.date.available2013-08-12T10:33:33Z-
dc.date.issued2013-
dc.identifier.citationJournal of Nanomaterials & Molecular Nanotechnologyuk
dc.identifier.urihttp://dspace.onu.edu.ua:8080/handle/123456789/3803-
dc.descriptionJournal of Nanomaterials & Molecular Nanotechnology. - 2013.uk
dc.description.abstractInternal reflection features caused by the surface plasmon resonance in nanoscale films containing defect tin dioxide clusters in the stoichiometric dielectric matrix are studied by means of polarization modulation of electromagnetic radiation. The angular and spectral characteristics of reflectances Rs2 and Rp2 of s- and p-polarized radiation and their polarization difference ρ=Rs2–Rp2 are measured in the wavelength range λ=400-1600 nm. The obtained experimental characteristics ρ(θ, λ) (θ is the radiation incidence angle) represent the optical property features associated with the film structure and morphology. Surface plasmon polaritons and local plasmons excited by s- and p-polarized radiation are detected; their frequency and relaxation properties are determined. The technique employed for studying surface plasmon resonance in tin dioxide films is appeared to be structurally sensitivuk
dc.language.isoenuk
dc.publisherSciTechnoluk
dc.relation.ispartofseries;V.2; p.1-8.-
dc.subjectTin dioxideuk
dc.subjectThin filmuk
dc.subjectSurface Plasmon resonanceuk
dc.titleClassic and Topologic Dimensional Effects in SnO2 Thin Films Detected by Surface Plasmon Resonance Techniqueuk
dc.typeArticleuk
Appears in Collections:Статті та доповіді ФМФІТ

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